Please use this identifier to cite or link to this item:
http://dspace.univ-bouira.dz:8080/jspui/handle/123456789/2412
Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | Betraoui, Fatima | - |
dc.date.accessioned | 2019-06-23T10:48:18Z | - |
dc.date.available | 2019-06-23T10:48:18Z | - |
dc.date.issued | 2014 | - |
dc.identifier.citation | université de bouira | en_US |
dc.identifier.uri | http://193.194.80.38:8080/jspui/handle/123456789/2412 | - |
dc.language.iso | fr | en_US |
dc.publisher | université de bouira | en_US |
dc.subject | oxyde thermique; le silicium PH. | en_US |
dc.title | simulation de la croissance de l'oxyde thermique sur des substrats de silicium | en_US |
dc.type | Thesis | en_US |
Appears in Collections: | Mémoires Master |
Files in This Item:
File | Description | Size | Format | |
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Untitled.pdf | 3,77 MB | Adobe PDF | View/Open |
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