Please use this identifier to cite or link to this item:
http://dspace.univ-bouira.dz:8080/jspui/handle/123456789/9159| Title: | Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni/glass and N/Si (1 0 0) thin films |
| Authors: | Benabbas, Abderrahim |
| Issue Date: | 1-Dec-2008 |
| Publisher: | Université Akli Mouhand Oulhadj-Bouira |
| URI: | http://dspace.univ-bouira.dz:8080/jspui/handle/123456789/9159 |
| Appears in Collections: | Articles |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Effect of deposition rate and thickness on the structural and electrical properties of evaporated Ni.pdf | 247,85 kB | Adobe PDF | View/Open |
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